Vertical tunnel field effect transistor (fet)

ABSTRACT

Among other things, one or more techniques for forming a vertical tunnel field effect transistor (FET), and a resulting vertical tunnel FET are provided herein. In an embodiment, the vertical tunnel FET is formed by forming a core over a first type substrate region, forming a second type channel shell around a circumference greater than a core circumference, forming a gate dielectric around a circumference greater than the core circumference, forming a gate electrode around a circumference greater than the core circumference, and forming a second type region over a portion of the second type channel shell, where the second type has a doping opposite a doping of the first type. In this manner, line tunneling is enabled, thus providing enhanced tunneling efficiency for a vertical tunnel FET.

BACKGROUND

Generally, a tunneling field effect transistor (FET) is a device wheredrive current is dominated by inter-band tunneling and comprises atunneling junction. Gated PIN diodes (e.g., tunnel FETs) have been shownto have similar tunneling device characteristics where current-voltagecharacteristics can be controlled by applying bias to the terminals ofthe device. These tunneling determined current-voltage characteristicsenable a sub-threshold swing (e.g., gate voltage swing needed toincrease the drain current by one decade (10×)) to not be limited to athermal limit of 60 mV/dec, such as for conventionalmetal-oxide-semiconductor field-effect transistors (MOSFETs), forexample. Accordingly, the sub-threshold swing in tunnel FETs are thusscalable. Various methods of fabrication have been proposed for tunnelFETs, such as different device designs. For example, a point tunnelingFET generally comprises a tunneling region where tunneling occursparallel to the gate. Thus, vertical and horizontal architectures havebeen proposed to enhance the tunneling probability. However, astunneling occurs parallel to the gate, the tunneling direction is notaligned to the gate electric field. Hence, the tunneling efficiency isnot efficient. Additionally, the sub-threshold swing of the pointtunneling FET degrades as a function of gate bias. This degradation isundesirable as it limits V_(DD) scaling and also the drive current andeffective swing needed to turn on the devices. Line tunneling FET on theother hand, has been proposed such that tunneling occurs perpendicularto the gate and a tunneling direction is aligned to the gate electricfield. However, such structures are made on homogeneous materials, andrequire heavily doped tunneling regions. To this end, a planar linetunneling FET is generally difficult to manufacture. Further, planarline tunneling devices require large gate-source overlap regions inorder to have significant tunneling and are therefore non-scalable withrespect to area required on the chip. Further, these devices alsorequire stringent doping and/or geometry requirements at least due tothe heavily doped tunneling region, for example. Accordingly, a devicelength and/or a gate length associated with a planar line tunneling FETgenerally is not scalable at least because the heavily doped region mustlie on top of a source region and under a gate region. For example, insome FETs, a gate region must overlap at least a portion of the sourceregion. Additionally, at least some current drifts from a channel of theFET to a drain of the FET, rather than tunneling, as desired. Issuesarising from forming ultra-thin layers and/or tunneling regions, sharptunneling junctions, heavy doping, and/or non-self aligning structuresthus complicate fabrication associated with planar line tunneling FETswith doped junctions.

SUMMARY

This summary is provided to introduce a selection of concepts in asimplified form that are further described below in the detaileddescription. This summary is not intended to be an extensive overview ofthe claimed subject matter, identify key factors or essential featuresof the claimed subject matter, nor is it intended to be used to limitthe scope of the claimed subject matter.

Among other things, one or more techniques and/or systems for forming avertical tunnel field effect transistor (FET) are provided herein. In anembodiment, a vertical tunnel FET is formed by forming a core over afirst type substrate region, forming a second type channel shell arounda circumference of at least the core, forming a gate dielectric aroundthe circumference of at least the core, forming a gate electrode aroundthe circumference of at least the core, and forming a second type regionover at least a portion of the second type channel shell. In anembodiment, the core comprises a nano-wire architecture, and the secondtype comprises a doping opposite a doping of the first type.

Accordingly, a vertical tunnel FET comprising enhanced tunnelingefficiency is provided such that a tunneling path is aligned with a gateelectric field direction. To this end, electron tunneling occurs alongthe tunneling path parallel to the gate electric field direction.Accordingly, a sub-threshold swing associated with switching of thevertical tunnel FET is thus improved by several orders of magnitude. Inan embodiment, supply voltage is scaled and/or reduced such that areduced amount of voltage is applied to the vertical tunnel FET tofacilitate switching. For example, the vertical tunnel FET requires lesssupply voltage by comparison to other tunnel FETs, for example.According to an aspect, transistor density is increased at least becauseof a vertical arrangement associated with an architecture of thevertical tunnel FET. For example, more transistors fit in a given areaat least because the nano-wire architecture of a vertical tunnel FETenables a FET to occupy space in a vertical fashion, rather thanhorizontally. Moreover, the vertical tunnel FET is easier to fabricatethan a planar line tunneling FET, for example, at least because thevertical tunnel FET does not require a heavily doped region fabricatedon top of a source region and under a gate region. In this way, avertical tunnel FET provides enhanced line tunneling.

The following description and annexed drawings set forth certainillustrative aspects and implementations. These are indicative of but afew of the various ways in which one or more aspects are employed. Otheraspects, advantages, and/or novel features of the disclosure will becomeapparent from the following detailed description when considered inconjunction with the annexed drawings.

DESCRIPTION OF THE DRAWINGS

Aspects of the disclosure are understood from the following detaileddescription when read with the accompanying drawings. It will beappreciated that elements and/or structures of the drawings are notnecessarily be drawn to scale. Accordingly, the dimensions of thevarious features may be arbitrarily increased and/or reduced for clarityof discussion.

It will be appreciated that at least some of the followingcross-sectional illustrations merely illustrate a portion of across-sectional view of an example vertical tunnel field effecttransistor (FET). For example, the portion of the cross-sectional viewis merely one side of the vertical tunnel FET, rather a portion, such asa half cross section of a cylindrical wire.

FIG. 1 is a portion of a cross-sectional view of an example verticalcore-shell nanowire tunnel field effect transistor (FET), according toan embodiment.

FIG. 2 is a flow diagram of an example method for forming a verticaltunnel field effect transistor (FET), according to an embodiment.

FIG. 3 is a cross-sectional view of an example vertical tunnel fieldeffect transistor (FET), according to an embodiment.

FIG. 4 is a flow diagram of an example method for forming a verticaltunnel field effect transistor (FET), according to an embodiment.

FIG. 5 is a cross-sectional view of an example vertical tunnel fieldeffect transistor (FET), according to an embodiment.

FIG. 6 is a cross-sectional view of an example vertical tunnel fieldeffect transistor (FET), according to an embodiment.

FIG. 7 is a cross-sectional view of an example vertical tunnel fieldeffect transistor (FET), according to an embodiment.

FIG. 8 is a cross-sectional view of an example vertical tunnel fieldeffect transistor (FET), according to an embodiment.

FIG. 9A is a cross-sectional view of example growth associated with avertical tunnel field effect transistor (FET), according to anembodiment.

FIG. 9B is a cross-sectional view of example growth associated with avertical tunnel field effect transistor (FET), according to anembodiment.

FIG. 9C is a cross-sectional view of example growth associated with avertical tunnel field effect transistor (FET), according to anembodiment.

FIG. 10A is a cross-sectional view of example growth associated with avertical tunnel field effect transistor (FET), according to anembodiment.

FIG. 10B is a cross-sectional view of example growth associated with avertical tunnel field effect transistor (FET), according to anembodiment.

DETAILED DESCRIPTION

The claimed subject matter is now described with reference to thedrawings, wherein like reference numerals are generally used to refer tolike elements throughout. In the following description, for purposes ofexplanation, numerous specific details are set forth in order to providea thorough understanding of the claimed subject matter. It is evident,however, that the claimed subject matter may be practiced without thesespecific details. In other instances, structures and devices areillustrated in block diagram form in order to facilitate describing theclaimed subject matter.

Generally, it is desired for a field effect transistor (FET), such as atunnel FET to achieve switching from an off state to an on state and/orvice versa with a steep swing while mitigating leakage current. Forexample, an on current associated with a speed of the swing and offcurrent is generally associated with leakage. To this end, an on to offratio of the respective currents is associated with a voltage level forachieving FET switching. It is generally desirable to achieve a reducedvoltage level for switching at least because a supply voltage (V_(DD))is reduced accordingly. To this end, one or more techniques for forminga vertical tunnel FET comprising enhanced tunneling efficiency, whichpromotes a reduced voltage level for switching, are provided herein. Inan embodiment, the vertical tunnel FET is formed by forming a core overa first type substrate region, forming a second type channel shellaround a circumference of at least a circumference of the core, forminga gate dielectric around the circumference of at least the circumferenceof the core, forming a gate electrode around the circumference of atleast the circumference of the core, and forming a second type regionover a portion of the second type channel shell. In an embodiment, thecore comprises a nano-wire architecture and the second type comprises adoping opposite a doping of the first type.

According to an aspect, the vertical tunnel FET provides for enhancedtunneling efficiency at least because line tunneling is enabled at leastdue to the nano-wire architecture of the vertical tunnel FET. Forexample, a tunneling path for electrons is substantially alignedparallel to a gate electric field direction, where a tunneling path ordirection oriented other than substantially parallel to a gate electricfield direction inhibits electron flow, movement, etc. Additionally, thevertical tunnel FET is scalable at least due to the vertical nature ofthe FET, thus enabling scaling. According to an aspect, scalingcomprises device size scaling, supply voltage scaling, and/or V_(DD)scaling. Moreover, transistor density is increased at least becausevertical devices occupy less surface area of a substrate, for example,than planar devices. For example, vertical tunnel FETs comprise avertical architecture configured to occupy less space when viewed from aphysical layout view at least because the vertical tunnel FETs formedvertically from a small footprint, rather than horizontally or laterallywith an expansive footprint. Additionally, tunneling probability isenhanced by the vertical core-shell architecture such that the tunnelingoccurs perpendicular to a gate, while mitigating use of heavily dopedtunneling regions and/or large gate-source overlap regions.

FIG. 1 illustrates a cross-sectional view 100 of an example verticaltunnel field effect transistor (FET). In an embodiment, the verticaltunnel FET comprises a first type substrate region 102, a core 110, asecond type channel shell 120, a gate dielectric 152, a gate electrode154, and a second type region 104. In an embodiment, the core 110, thesecond type channel shell 120, the gate dielectric 152, and the gateelectrode 154 comprise a vertical architecture and/or verticalorientation with respect to the first type substrate region 102. Inanother embodiment, the core 110 comprises a nano-wire architecture,which is described in more detail herein. It will be appreciated thatthe second type comprises a doping opposite a doping of the first type.For example, if the first type substrate region 102 comprises a p-typematerial, the second type channel shell 120 and the second type region104 comprise an n-type material. Conversely, if the first type substrateregion 102 comprises an n-type material, the second type channel shell120 and the second type region 104 comprise a p-type material. Accordingto an aspect, the first type substrate 102 comprises a source region andthe second type region comprises a drain region. It will be appreciatedthat in other embodiments, the first type substrate 102 comprises thedrain region and the second type region comprises the source region.

It will be appreciated that “circumference” is used herein to meanand/or reference a perimeter and/or the like, and does not necessarilylimit a shape of an associated structure to circular and/or cylindrical,for example. For example, circumference is viewed as a cross-sectionperpendicular to the cross-sectional view 100 of FIG. 1, such as takenalong line A-A, for example. To this end, it will be appreciated thatany of the structures described herein, including, but not limited to,the substrate 102, the core 110, the second type channel shell 120, thegate dielectric 152, the gate electrode 154, and/or the second typeregion 104, etc. comprise a variety of possible shapes. In anembodiment, such structures comprise at least one of a cylindricalshape, a rectangular shape, a square shape, a cubic shape, a triangularshape, etc. when viewed from the cross-section perpendicular to thecross-sectional view 100 of FIG. 1.

Additionally, it will be appreciated that in other embodiments,cross-sectional views herein merely comprise a portion of the verticaltunnel FET. For example, at least some of the cross-sectional viewscomprise a view of merely one quadrant of a vertical tunnel FET. Thatis, for example, if a vertical tunnel FET comprises a wire shape and/ora cylindrical shape, at least some of the cross-sectional views of thefigures are associated with at least two cross-section cuts. Forexample, a first cross-sectional cut cuts the vertical tunnel FETvertically, and a second cross-sectional cut, offset by about ninetydegrees from the first cross-sectional cut, cuts the vertical tunnel FETvertically such that the second cross-sectional cut is substantiallyperpendicular to the first cross-sectional cut. In other words, a figuremerely illustrates a left portion and/or a right portion of across-section of a vertical tunnel FET, for example. For example, a fullcross-section of a vertical tunnel FET also comprises a mirror of thatwhich is illustrated in FIG. 1. For example, in an embodiment, secondtype channel shell 120 comprises a shell “wrapped” around core 110, andthus comprises a portion to the right, which is not shown in FIG. 1, ofcore 110. Accordingly, the first type substrate region 102, the gatedielectric 152, the gate electrode 154, and/or the second type region104 comprise respective portions that have a mirror arrangement relativeto a second portion, such as a second half, for example, of the core,where the second portion of the core is likewise not illustrated as thecore has been vertically cut, and thus the second portion of the core islocated to the right of the left portion of the core which isillustrated. It is to be appreciated that this vertically cutarrangement is likewise depicted in other Figs. as well.

In an embodiment, the core 110 comprises a first type material. In thisembodiment, the second type channel shell 120 is formed around acircumference of at least the core 110 to enable line tunneling ofelectrons at least from the core 110 to the second type channel shell120. In an embodiment, the core 110 comprises a p-type core comprisingGaSb, and the second type channel shell 120 comprises n-type materialcomprising InAs. In another embodiment, n-type and p-type materialscomprise a broken-gap architecture, for example.

In an embodiment, the gate dielectric 152 comprises an equivalent oxidethickness (EOT) less than 1 nm and the gate electrode 154 comprises atleast one of polysilicon or metal. According to an aspect, the secondtype region 104 is formed over at least a portion of the second typechannel shell 120. According to another aspect, the second type region104 is formed over at least a portion of the core 110. In an embodiment,the gate dielectric 152 is formed such that the gate electrode 154 isnot in contact with the first type substrate region 102. For example, inan embodiment, the gate dielectric 152 and/or the gate electrode 154comprises an “L” shape when viewed from a cross-section.

In an embodiment, line tunneling is enabled via the core 110 and thesecond type channel shell 120. For example, in an embodiment, tunnelingoccurs from the core 110 to the second type channel shell 120. To thisend, a tunneling path parallel to the gate electric field directionenables electron tunneling parallel to the gate electric field. That is,for example, if the core 110 comprises a p-type material and the secondtype channel shell 120 comprises an n-type material, electron tunnelingoccurs from the core 110 to the second type channel shell 120. To thisend, current flows vertically through the vertical tunnel FET, such thatthe current flow is substantially perpendicular to the electrontunneling, for example. In an embodiment, current flow, such as flow ofelectrons and/or holes, for example, generally flows vertically throughsecond type channel shell 120 between the first type substrate region102 and the second type region 104. In another embodiment, tunnelingoccurs from the second type channel shell 120 into the core 110. To thisend, the vertical tunnel FET of FIG. 1 provides for enhanced tunnelingefficiency at least because of an alignment of a tunneling path forelectrons. Additionally, the vertical tunnel FET is scalable, enables anincrease in transistor density, and is manufactured with ease, withoutrequiring heavy doping, such as into a substrate, for example, at leastdue to a vertical nano-wire architecture associated with the verticaltunnel FET.

FIG. 2 illustrates a flow diagram of an example method 200 for forming avertical tunnel field effect transistor (FET). At 202, the method 200starts. At 204, a core is formed over a first type substrate region.According to an aspect, the first type substrate region is doped. In anembodiment, the core comprises a first type material. In anotherembodiment, the core is formed of a wide bandgap buffer material suchthat the wide bandgap buffer core provides structural support. In anembodiment, the wide bandgap buffer core is formed from a nano-wirecore. In an example, the wide bandgap buffer core is configured toprovide physical support for the vertical nano-wire architecture of avertical tunnel FET. To this end, the support provided by the widebandgap buffer enables one or more surrounding shells to comprise athinner profile, as they need not be dimensioned to provide structuralsupport or integrity, for example. To this end, a second type channelshell, a first type shell, a gate dielectric, and/or a gate electrodecomprise a thickness from several nanometers to several hundrednanometers, for example. In an embodiment, the wide bandgap buffer formsa shell rather than or in addition to a core.

At 206, a second type channel shell is formed around a circumference ofat least the core, where the second type comprises a doping opposite adoping of the first type. In an embodiment, the core is formed of afirst type material. For example, the core and/or first type substrateregion are formed of a p-type material and the second type channel shellis formed of an n-type material. In another example, the core and/orfirst type substrate region are formed of an n-type material and thesecond type channel shell is formed of a p-type material.

According to an aspect, the core is formed of a wide bandgap buffermaterial, and a first type shell is formed around a circumference of atleast the core. In this example, the second type channel shell is formed206 around a circumference of at least the first type shell. However, itwill be appreciated that in other embodiments, the second type channelshell is formed 206 around a circumference of at least the core whilethe first type shell is formed around a circumference of at least thesecond type channel shell.

In an embodiment, a wide bandgap barrier is formed around acircumference of at least the core. To this end, the wide bandgapbarrier is configured to mitigate diffusion associated with a leakagefloor. For example, diffusion occurring between a first type core andthe second type channel shell is generally undesirable. Accordingly, thewide bandgap buffer is configured to inhibit this diffusion such thatleaking is mitigated, for example. In an embodiment, the wide bandgapbuffer is thus formed between a first type core and the second typechannel shell.

At 208, a gate dielectric is formed around a circumference of at leastthe core. At 210, a gate electrode is formed around a circumference ofat least the core. According to an aspect, the gate dielectric is formed208 such that the gate electrode is not in contact with the first typesubstrate region, for example. In other words, the gate dielectric isformed 208 such that the gate dielectric is between and/or separates thegate electrode and the first type substrate region from one another, forexample.

At 212, a second type region is formed over at least a portion of thesecond type channel. For example, the second type region is grownhorizontally and/or laterally from at least a portion of at least one ofthe core and/or shells, etc. In an embodiment, the second type region isformed over at least a portion of the core. In other embodiments, thesecond type region is formed over at least a portion of at least one ofthe first type shell, the wide bandgap barrier, the wide bandgap buffer,and/or the gate dielectric. In an embodiment, the first type and secondtype comprise a material system based on a broken-gap architecture.

In an embodiment, the core is grown by seeding at least a portion of thefirst type substrate region to form a seed layer. To this end, at leasta portion of the seed layer is patterned, thus enabling growth of thecore, for example. It will be appreciated that the core, the second typechannel shell, the first type shell, the gate dielectric, the gateelectrode, and/or the second type region are formed in a variety ofways. For example, respective shells and/or layers are formed based atleast in part on at least one of molecular beam epitaxy (MBE), chemicalvapor deposition (CVD), physical vapor deposition (PVD), a growthprocess, a selective growth process, a non-selective growth process,orientation dependent growth, an etching process, a non-selectiveetching process, and/or selective etching. Additionally, it will beappreciated that one or more shells and/or layers are formed in anyorder relative to one another. In an embodiment any one or more shellsand/or layers are doped during formation. For example, in an embodiment,the second type channel shell is formed adjacent to the core and thefirst type shell is formed around the second type channel shell. At 214,the method 200 ends.

FIG. 3 illustrates a cross-sectional view 300 of an example verticaltunnel field effect transistor (FET). In an embodiment, the examplevertical tunnel FET comprises a first type substrate region 102, core110, wide bandgap barrier 240, second type channel shell 120, gatedielectric 152, gate electrode 154, and second type region 104. In anembodiment the core 110 is vertically aligned with respect to the firsttype substrate region 102. For example, the core 110 is grown verticallyfrom the first type substrate region 102. In an embodiment, the core 110comprises a diameter ranging from a few nanometers to several hundrednanometers.

In an embodiment, the wide bandgap barrier 240 is configured to mitigateleakage between the first type core 110 and the second type channelshell 120. In an embodiment, leakage is mitigated by suppressingdiffusion associated with a leakage floor. In another embodiment, thewide bandgap barrier 240 is configured to mitigate leakage between afirst type shell and the second type channel shell 120. To this end, thewide bandgap barrier mitigates leakage at least because reducingunwanted diffusion from the core 110 to the second type channel shell120 generally reduces leakage.

According to an aspect, the core 110 is grown in a vertical directionfrom a patterned seed layer (not shown) on first type substrate region102. In an example, wide bandgap barrier 240 is grown in a horizontaldirection from core 110. In this example, the core 110 acts as a seedlayer for the wide bandgap barrier 240. To this end, the wide bandgapbarrier acts as a seed layer for additional horizontal growthaccordingly. Additionally, second type channel shell 120, gatedielectric 152, and/or gate electrode 154 are similarly grown,respectively. Second type region 104 is grown from core 110 and formedto cover at least some of the aforementioned layers 240, 120, 152. In anembodiment, second type region 104 is laterally etched such that thesecond type region 104 covers the second type channel shell 120, but notthe gate electrode 154, for example. It will be appreciated that secondtype region 104 is grown in the vertical direction and/or the horizontaldirection, according to a desired profile. For example, the second typeregion 104 is grown vertically from the core 110 and is then grownhorizontally or laterally from the portion of the second type regionthat has been grown vertically. It will be appreciated that in someembodiments, the second type region 104 is grown horizontally and/orvertically. For example, the second type region is grown bothhorizontally and/or vertically in a growth process.

FIG. 4 illustrates a flow diagram of an example method 400 for forming avertical tunnel field effect transistor (FET). At 402, the method 400begins, and at 404 a wide bandgap buffer core is formed above a firsttype substrate region. In an embodiment, the wide bandgap buffer core isformed based on a vertical nano-wire core architecture designed toprovide support for the vertical tunnel FET and/or layers within thevertical tunnel FET. For example, in an embodiment, the wide bandgapbuffer core enables shells and/or layers surrounding the core tocomprise a thin profile, thus reducing a size of the vertical tunnel FETfrom a design layout view, for example. That is, due to the structuralintegrity afforded by the wide bandgap buffer core, one or more shellsand/or layers surrounding the core have respective thicknesses that areless than they would otherwise be in the absence of the wide bandgapbuffer core. To this end the wide bandgap buffer core is grownvertically and comprises a vertical orientation and/or profile withrespect to the first type substrate region, for example.

At 406, a first type shell is formed around a circumference of at leastthe wide bandgap buffer core. In an embodiment, the shell is grown in ahorizontal fashion from the core and comprises p-type material. Inanother embodiment, the first type shell comprises an n-type material.At 408, a second type channel shell is formed around a circumference ofat least the wide bandgap buffer core, where the second type comprises adoping opposite a doping of the first type. In an embodiment, the secondtype channel shell is formed around a circumference of at least thefirst type shell. In another embodiment, the first type shell is formedaround a circumference of at least the second type channel shell, forexample. In some embodiments, a wide bandgap barrier is formed betweenthe first type shell and the second type channel shell, for example. Thewide bandgap barrier is formed to, among other things, mitigateundesired leakage between the first type shell and the second typechannel shell.

At 410, a gate dielectric is formed around a circumference of at leastthe wide bandgap buffer core. In an embodiment, the gate dielectric isformed around a circumference of at least the second type channel shell.To this end, a gate electrode is formed around a circumference of atleast the wide bandgap buffer core at 412. According to an aspect, thegate electrode is formed around a circumference of at least the gatedielectric, for example.

At 414, a second type region is formed above at least a portion of thesecond type channel shell. For example, the second type region is formedby horizontal and/or lateral growth associated with at least a portionof at least one of the core, shells, and/or other layers. In anembodiment, the first type shell is flush with the second type channelshell, the gate dielectric, and the gate electrode along a border of thesecond type region. In another embodiment, the second type region isformed above at least a portion of the second type channel shell, thefirst type shell, and the gate dielectric. In yet another embodiment,the second type region is formed above at least a portion of the secondtype channel shell, the first type shell, the gate dielectric, and thewide bandgap buffer core. In this embodiment, the first type shell isflush with the second type channel shell, the gate dielectric, the gateelectrode, and the wide bandgap buffer core along a border of the secondtype region. At 416, the method 400 ends.

FIG. 5 illustrates a cross-sectional view 500 of an example verticaltunnel field effect transistor (FET). In an embodiment, the verticaltunnel FET comprises first type substrate region 102, wide bandgapbuffer core 110, first type shell 530, second type channel shell 120,gate dielectric 152, gate electrode 154, and second type region 104, forexample. It will be appreciated that the first type comprises a dopingopposite a doping of the second type and vice versa. For example, if afirst type comprises an n-type material, a second type generallycomprises a p-type material. Additionally, gate dielectric 152 isconfigured to mitigate electrical contact between gate electrode 154 andfirst type substrate region 102, for example. In this example, the corecomprises a wide bandgap buffer core 110. To this end, the wide bandgapbuffer provides physical support for an architecture associated with thevertical tunnel FET. In an embodiment, the wide bandgap buffer comprisesat least one of AlAsSb or GaAs.

In an embodiment, the vertical tunnel FET of FIG. 5 is fabricated byseeding the first type substrate region 102 to form a seed layer andpatterning the seed layer such that the seed layer corresponds to widebandgap buffer core 110. To this end, the wide bandgap buffer core 110is vertically grown based on the corresponding patterned seed layer andthe first type substrate 102. In this example, first type shell 530 isgrown horizontally from the wide bandgap buffer core 110. Second typechannel shell 120 is horizontally grown from the first type shell 530,and gate dielectric 152 is grown horizontally from the second typechannel shell 120. In an embodiment, the gate dielectric 152 is grownvertically to form a rectangular shape, followed by horizontal selectivegrowth at a base of the gate dielectric 152 to form an “L” shape. Inanother embodiment, gate dielectric 152 is grown, and a portion isselectively etched to form the “L” shape. To this end, gate 154 issimilarly formed, such as by vertical growth, horizontal growth and/oretching, for example. In an embodiment, second type region 104 is grownvertically above the wide bandgap buffer core 110 and laterally and/orhorizontally to cover at least the second type channel shell 120. Forexample, second type region 104 is grown using nano-wire growth toenable growth in a horizontal direction and/or a vertical direction.

In another embodiment, the vertical tunnel FET is fabricated bypatterning the seed layer to comprise a width of second type region 104and growing the wide bandgap buffer core 110 over first type substrateregion 102, such that the wide bandgap buffer core 110 has a widthcorresponding to the width of the second type region 104. Second typeregion 104 is grown over the wide bandgap buffer core 110. Given thatthe wide bandgap buffer core 110 has a width corresponding to the widthof the second type region 104, the wide bandgap buffer core 110 isetched horizontally to produce the wide bandgap buffer coreconfiguration illustrated in FIG. 5, where the width of the wide bandgapbuffer core is less than the width of the second type region 104.Respective shells and/or layers are grown from the wide bandgap buffercore accordingly. For example, the first type shell 530, second typechannel shell 120, gate dielectric 152, and gate electrode 154 are grownin a successive fashion. Additionally, in an example, a wide bandgapbarrier is grown between the first type shell 530 and the second typechannel shell 120. In an embodiment, the wide bandgap barrier comprisesa shell shape, such as similar to other layers, for example.

FIG. 6 illustrates a cross-sectional view 600 of an example verticaltunnel field effect transistor (FET). In an embodiment, the verticaltunnel FET comprises first type substrate region 102, wide bandgapbuffer core 110, first type shell 530, wide bandgap barrier 240, secondtype channel shell 120, gate dielectric 152, gate electrode 154, andsecond type region 104, for example. In this example, the core comprisesa wide bandgap buffer core 110 configured to provide physical supportfor a nano-wire architecture associated with the vertical tunnel FET. Inan embodiment, the second type region 104 is formed over at least aportion of the second type channel shell 120. In another embodiment, thesecond type region 104 is formed over at least a portion of at least oneof the core 110, the first type shell 530, the wide bandgap barrier 240,or the gate dielectric 152. In an embodiment the first type substrateregion 102 is doped.

In an embodiment, the vertical tunnel FET of FIG. 6 is fabricated byseeding the first type substrate region 102 to form a seed layer andpatterning the seed layer such that the seed layer corresponds to a widebandgap buffer core 110. That is, the patterned seed layer has a widthcorresponding to a width of the wide bandgap buffer core 110. To thisend, the wide bandgap buffer core 110 is vertically grown based on thecorresponding patterned seed layer and the first type substrate 102. Inthis example, the wide bandgap barrier 240 is horizontally grown fromthe first type shell 530.

In other embodiments, the second type region 104 does not cover a coreof the vertical tunnel FET. For example, FIG. 7 illustrates across-sectional view 700 of an example vertical tunnel field effecttransistor (FET) where the second type region 104 does not cover a core110 of the vertical tunnel FET. In another example, FIG. 8 illustrates across-sectional view 800 of an example vertical tunnel field effecttransistor (FET) where the second type region 104 similarly does notcover a core 110 of the vertical tunnel FET. In FIGS. 7 and 8, thevertical tunnel FET comprises a first type substrate region 102, a core110, a first type shell 530, a second type channel shell 120, a gatedielectric 152, a gate electrode 154, and a second type region 104, forexample. In FIG. 8, however, a wide bandgap barrier 240 is also disposedbetween the first type shell 530 and the second type channel shell 120,whereas such a wide bandgap barrier is not included in FIG. 7. In anembodiment, the core 110 comprises a wide bandgap buffer core configuredto provide at least some structural and/or mechanical support for atleast one of the first type shell 530, the second type channel shell120, the gate dielectric 152, and/or the gate electrode 154. In anembodiment, the structural integrity afforded by the wide bandgap buffercore 110 enables at least one of the first type shell 530, the secondtype channel shell 120, the gate dielectric 152, and/or the gateelectrode 154 to be formed to a thickness less than otherwisepermissible in the absence of the wide bandgap buffer core. In anembodiment, respective shells and/or layers are less than 2 nm thick.For example, the wide bandgap buffer core 110 provides additionalstructural and/or mechanical support at least because the second typeregion 104 does not cover the wide bandgap buffer core 110, enabling thecore to comprising an additional length, at least relative to anembodiment where the second type region 104 covers the wide bandgapbuffer core, for example.

In an embodiment, a seed layer is deposited and patterned on first typesubstrate region 102. To this end, after patterning, the seed layercorresponds to an area where the wide bandgap buffer core 110 is grown,for example. Accordingly, the wide bandgap buffer core 110 is grownvertically over the first type substrate region 102. In an embodiment,the wide bandgap buffer core is grown to a height corresponding to aheight of the first type shell 530, and the first type shell 530 isgrown horizontally from the wide bandgap buffer core 110. To this end,the second type channel shell 120, wide bandgap barrier 240 of FIG. 8,gate dielectric 152, and/or gate electrode 154 are grown similarly. Inthis embodiment, wide bandgap buffer core 110 is grown to a secondheight that is higher than the height of the first type shell 530 andthe second type region 104 is grown horizontally from the wide bandgapbuffer core 110 and/or vertically from at least some of at least one ofthe first type shell 530, the wide bandgap barrier 240, the second typechannel shell 120, the gate dielectric 152, the gate electrode 154,and/or other materials, for example. For example, the second type region104 is grown horizontally or laterally from the portion of the widebandgap buffer core 110 that extends above first type shell 530.

In another embodiment, the wide bandgap buffer core 110 is grown to aheight higher than a height of the first type shell 530. In thisembodiment, first type shell 530 is at least one of grown usingselective growth or grown horizontally along the wide bandgap buffercore 110 and etched such that the height of the first type shell 530 isless than the height of the wide bandgap buffer core 110. To this end,second type channel shell 120, gate dielectric 152, and/or gateelectrode 154 are formed in a similar fashion, for example. Accordingly,second type region 104 is grown horizontally and/or vertically such thatthe second type region 104 covers at least a portion of the second typechannel shell 120. In an embodiment, the second type region is grown andetched to create a desired profile and/or shape.

FIG. 9A illustrates a cross-sectional view 900 of example growthassociated with a vertical tunnel field effect transistor (FET). Forexample, a seed layer 910 is deposited on first type substrate region102. In an embodiment, the seed layer 910 comprises gold (Au), forexample. It will be appreciated that a variety of techniques exist fordepositing the seed layer 910, such as chemical vapor deposition (CVD),for example. FIG. 9B illustrates a cross-sectional view 940 of examplegrowth associated with a vertical tunnel field effect transistor (FET)where the seed layer 910 is patterned. In an embodiment, the seed layeris patterned using a mask (not shown). FIG. 9C illustrates across-sectional view 980 of example growth associated with a verticaltunnel field effect transistor (FET). In an embodiment, growth occurssuch that the seed layer 910 remains on top of core growth 920, whilethe core 110 is formed vertically over first type substrate region 102.

FIG. 10A illustrates a cross-sectional view 1000 of example growthassociated with a vertical tunnel field effect transistor (FET). Forexample, a core 110 is grown on top of at least a portion of first typesubstrate region 102. In this example, a layer 1010 is horizontallygrown from core 110. FIG. 10B illustrates a cross-sectional view 1040 ofexample growth associated with a vertical tunnel field effect transistor(FET). In an embodiment, a layer 1080 is selectively grown 1090 suchthat a height of the layer 1080 is less than a height of the core 110,for example. In another embodiment, etching is utilized to achieve theheight of layer 1080 such that the height is less than the height ofcore 110. For example, etching at 1090 enables control of a size,height, and/or thickness of layer 1080 such that layer 1080 comprises adesired profile. In this way, an enhanced vertical tunnel FET isprovided. The examples illustrated in FIGS. 10A and 10B are possibletechniques for forming the second type region 104 in one or moreaforementioned embodiments, for example.

According to an aspect, a method for forming a vertical tunnel fieldeffect transistor (FET) is provided, comprising forming a core over afirst type substrate region, forming a second type channel shell arounda circumference of at least the core, the second type comprising adoping opposite a doping of the first type, forming a gate dielectricaround the circumference of at least the core, forming a gate electrodearound the circumference of at least the core, and forming a second typeregion over at least a portion of the second type channel shell.

According to an aspect, a vertical tunnel FET comprises a first typesubstrate, a core disposed above the first type substrate, a second typechannel shell surrounding a circumference of at least the core, thesecond type comprising a doping opposite a doping of the first type, agate dielectric surrounding the circumference of at least the core, agate electrode surrounding the circumference of at least the core, and asecond type region disposed above at least a portion of the second typechannel shell.

According to an aspect, a method for forming a vertical tunnel FET isprovided, comprising forming a wide bandgap buffer core above a firsttype substrate region, forming a first type shell around a circumferenceof at least the wide bandgap buffer core, forming a second type channelshell around a circumference of at least the wide bandgap buffer core,the second type comprising a doping opposite a doping of the first type,forming a gate dielectric around the circumference of at least the widebandgap buffer core, forming a gate electrode around the circumferenceof at least the wide bandgap buffer core, and forming a second typeregion above at least a portion of the second type channel shell, thefirst type shell flush with the second type channel shell, the gatedielectric, and the gate electrode along a border of the second typeregion.

Although the subject matter has been described in language specific tostructural features and/or methodological acts, it is to be understoodthat the subject matter of the appended claims is not necessarilylimited to the specific features or acts described above. Rather, thespecific features and acts described above are disclosed as exampleforms of implementing the claims.

Various operations of embodiments are provided herein. The order inwhich some or all of the operations are described should not beconstrued as to imply that these operations are necessarily orderdependent. Alternative ordering will be appreciated by one skilled inthe art having the benefit of this description. Further, it will beunderstood that not all operations are necessarily present in eachembodiment provided herein.

It will be appreciated that layers, features, elements, such as thefirst type substrate region, core, wide bandgap buffer core, first typeshell, second type channel shell, wide bandgap barrier, gate electrode,gate dielectric, second type region, etc. depicted herein areillustrated with particular dimensions relative to one another, such asstructural dimensions and/or orientations, for example, for purposes ofsimplicity and ease of understanding and that actual dimensions of thesame differ substantially from that illustrated herein, in someembodiments. Additionally, a variety of techniques exist for forming thelayers features, elements, etc. mentioned herein, such as implantingtechniques, doping techniques, spin-on techniques, sputtering techniquessuch as magnetron or ion beam sputtering, growth techniques, such asthermal growth and/or deposition techniques such as chemical vapordeposition (CVD), for example.

Moreover, “exemplary” is used herein to mean serving as an example,instance, illustration, etc., and not necessarily as advantageous. Asused in this application, “or” is intended to mean an inclusive “or”rather than an exclusive “or”. In addition, “a” and “an” as used in thisapplication and the appended claims are generally be construed to mean“one or more” unless specified otherwise or clear from context to bedirected to a singular form. Also, at least one of A and B and/or thelike generally means A or B or both A and B. Furthermore, to the extentthat “includes”, “having”, “has”, “with”, or variants thereof are usedin either the detailed description or the claims, such terms areintended to be inclusive in a manner similar to the term “comprising”.

Also, although the disclosure has been shown and described with respectto one or more implementations, equivalent alterations and modificationswill occur to others skilled in the art based upon a reading andunderstanding of this specification and the annexed drawings. Thedisclosure includes all such modifications and alterations and islimited only by the scope of the following claims.

What is claimed is:
 1. A method for forming a vertical tunnel fieldeffect transistor (FET), comprising: forming a core over a first typesubstrate region; forming a second type channel shell around acircumference of at least the core, the second type comprising a dopingopposite a doping of the first type; forming a gate dielectric aroundthe circumference of at least the core; forming a gate electrode aroundthe circumference of at least the core; and forming a second type regionover at least a portion of the second type channel shell.
 2. The methodof claim 1, comprising: forming the core of a first type material; andforming the second type region over at least a portion of the first typecore.
 3. The method of claim 1, comprising forming a wide bandgapbarrier around the circumference of at least the core.
 4. The method ofclaim 3, comprising forming the wide bandgap barrier between the firsttype core and the second type channel shell.
 5. The method of claim 1,comprising: forming the core of a p-type material over a p-typesubstrate, the p-type substrate comprising a source region; forming thesecond type channel shell of an n-type material; and forming the secondtype region of an n-type material over at least a portion of the p-typecore, the second type region comprising a drain region.
 6. The method ofclaim 1, comprising: forming the core of an n-type material over ann-type substrate, the n-type substrate comprising a source region;forming the second type channel shell of a p-type material; and formingthe second type region of a p-type material over at least a portion ofthe n-type core, the second type region comprising a drain region. 7.The method of claim 1, comprising: forming the core of a wide bandgapbuffer material; forming a first type shell around a circumference of atleast the core; and forming the second type region over at least aportion of the first type shell.
 8. The method of claim 7, comprisingforming the second type region over at least a portion of the core. 9.The method of claim 1, comprising seeding at least a portion of thefirst type substrate region to form a seed layer.
 10. The method ofclaim 9, comprising patterning at least a portion of the seed layer. 11.The method of claim 1, comprising doping at least a portion of the firsttype substrate region.
 12. The method of claim 1, comprising forming atleast one of the core, the second type channel shell, the gatedielectric, the gate electrode, or the second type region using at leastone of molecular beam epitaxy (MBE) or chemical vapor deposition (CVD).13. The method of claim 1, forming the gate dielectric comprisingforming the gate dielectric at least between the first type substrateregion and the gate electrode.
 14. A vertical tunnel field effecttransistor (FET), comprising: a first type substrate; a core disposedabove the first type substrate; a second type channel shell surroundinga circumference of at least the core, the second type comprising adoping opposite a doping of the first type; a gate dielectricsurrounding the circumference of at least the core; a gate electrodesurrounding the circumference of at least the core; and a second typeregion disposed above at least a portion of the second type channelshell.
 15. The tunnel FET of claim 14: the core comprising a first typematerial; and the second type region disposed above at least a portionof the first type core.
 16. The tunnel FET of claim 14 comprising a widebandgap barrier surrounding the circumference of at least the core. 17.The tunnel FET of claim 14: the first type substrate comprising p-typematerial and a source region; the core comprising p-type material; thesecond type channel shell comprising n-type material; and the secondtype region comprising n-type material and a drain region.
 18. Thetunnel FET of claim 14: the first type substrate comprising n-typematerial and a source region; the core comprising n-type material; thesecond type channel shell comprising p-type material; and the secondtype region comprising p-type material and a drain region.
 19. Thetunnel FET of claim 14, the gate electrode comprising at least one of ametal or polysilicon.
 20. A method for forming a vertical tunnel fieldeffect transistor (FET), comprising: forming a wide bandgap buffer coreabove a first type substrate region; forming a first type shell around acircumference of at least the wide bandgap buffer core; forming a secondtype channel shell around a circumference of at least the wide bandgapbuffer core, the second type comprising a doping opposite a doping ofthe first type; forming a gate dielectric around the circumference of atleast the wide bandgap buffer core; forming a gate electrode around thecircumference of at least the wide bandgap buffer core; and forming asecond type region above at least a portion of the second type channelshell, the first type shell flush with the second type channel shell,the gate dielectric, and the gate electrode along a border of the secondtype region.